Refrigeration – Cryogenic treatment of gas or gas mixture – Separation of gas mixture
Patent
1997-11-04
1999-09-21
Kilner, Christopher B.
Refrigeration
Cryogenic treatment of gas or gas mixture
Separation of gas mixture
62630, F25J 302
Patent
active
059539356
ABSTRACT:
An improved ethane recovery system and process which increases the recovery of ethane up to about 99% with no increase in plant residue compression horsepower. The improved ethane recovery process employs an additional fractionation column which receives two vapor streams in different regions thereof which allows the fractionation column to produce the top reflux to the demethanizer column.
REFERENCES:
patent: 4157904 (1979-06-01), Campbell et al.
patent: 4278457 (1981-07-01), Campbell et al.
patent: 4453958 (1984-06-01), Gulsby et al.
patent: 4519824 (1985-05-01), Huebel
patent: 4617039 (1986-10-01), Buck
patent: 4680042 (1987-07-01), Mehra
patent: 4687499 (1987-08-01), Aghili
patent: 4695303 (1987-09-01), Montgomery, IV et al.
patent: 4696688 (1987-09-01), Mehra
patent: 4698081 (1987-10-01), Aghili
patent: 4832718 (1989-05-01), Mehra
patent: 4851020 (1989-07-01), Montgomery, IV
patent: 4854955 (1989-08-01), Campbell et al.
patent: 4869740 (1989-09-01), Campbell et al.
patent: 4883515 (1989-11-01), Mehra et al.
patent: 4889545 (1989-12-01), Campbell et al.
patent: 5275005 (1994-01-01), Campbell et al.
patent: 5325673 (1994-07-01), Durr et al.
patent: 5566554 (1996-10-01), Vijayaraghavan et al.
patent: 5685170 (1997-11-01), Sorensen
patent: 5890377 (1999-04-01), Foglietta
patent: 5890378 (1999-04-01), Rambo et al.
Edwards Robert J.
Kalka Daniel S.
Kilner Christopher B.
McDermott Engineers & Constructors (Canada) Ltd.
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