Etching system

Details Etching system Etching system

1996-07-29

2000-08-08

Breneman, Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723E, 118723MA, C23F 102, C23C 1600

Patent

active

060996870

ABSTRACT:
A small, light-weight and highly maintainable etching system and an etching method for etching a large substrate with a homogeneous etching rate are provided. The etching system comprises an agitating electric field system disposed around the substrate, an agitating power source of high frequency, medium frequency or low frequency, agitating electrodes, amplifiers and a phase controller to agitate electrons or ions to increase the etching speed and the uniformity of the etching rate by promoting activation of reactive gas and uniformalizing a plasma density.

REFERENCES:
patent: 4963242 (1990-10-01), Sato et al.
patent: 5330606 (1994-07-01), Kubota et al.

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