Etching solutions containing ammonium fluoride and an alkyl poly

Details Etching solutions containing ammonium fluoride and an alkyl poly Etching solutions containing ammonium fluoride and an alkyl poly

1987-01-27

1988-08-02

Schor, Kenneth M.

Compositions

Etching or brightening compositions

Inorganic acid containing

156657, 156662, C09K 1308

Patent

active

047612444

ABSTRACT:
Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of a nonionic alkyl polysaccharide having the formula:

REFERENCES:
patent: 2942956 (1960-06-01), Kelly
patent: 3181984 (1965-05-01), Tillis
patent: 3992235 (1976-11-01), Garbarini
patent: 4040897 (1977-08-01), Blish, II et al.
patent: 4517106 (1985-05-01), Hopkins et al.
patent: 4582624 (1986-04-01), Enjo et al.
patent: 4620934 (1986-09-01), Hopkins et al.
Fluorad, Fluorochemical Surfactants, A product information bulletin by 3M 1982.
Hoffmeister, Schumacher "Method of Reducing . . . by Adding Isopropanol" IBM Tech. Dis. Bull., vol. 27, No. 3 1979.
McCutcheon's Emulsifiers and Detergents, North American Edition, Special Food Emulsifier Section, 1982, p. 275.

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