Etching solution for forming an embedded resistor

Details Etching solution for forming an embedded resistor Etching solution for forming an embedded resistor

2005-01-11

2005-01-11

Mills, Gregory (Department: 1763)

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

Reexamination Certificate

active

06841084

ABSTRACT:
A resistive etching solution containing thiourea, which is particularly suitable for etching an electrically resistive material comprised of a nickel-chromium alloy. The resistive etching solution allows for fast and effective etching of a nickel-chromium alloy in cases where the ratio of (a) copper surface area to (b) nickel/chromium surface area, is relatively large, and where fine feature etching is desired.

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