Etching solution

Details Etching solution Etching solution

1990-08-06

2000-10-10

Wu, Shean C.

Compositions

Etching or brightening compositions

Alkali metal hydroxide containing

252 792, 216 78, 216106, C09K 1302, C09K 1304, C23F 118, C23F 134

Patent

active

061298581

ABSTRACT:
An electrolytically reclaimable etching solution for etching circuit boards and mold parts of copper and copper-based alloys, with a content of copper tetrammine sulfate, ammonia, ammonium sulfate, ammoniachloride, if necessary ammonium nitrate, and also a catalyzer for raising the etching rate. According to the invention, such an etching solution excels through a content of vanadium or a vanadium compound as a catalyzer in a concentration of 1 mg to 99 mg/l of etching solution, calculated as vanadium.

REFERENCES:
patent: 4319955 (1982-03-01), Murski
CAPLUS 1984:579938, 1984.
WPIDS 84-208150, 1984.
CAPLUS 1986-210622, 1986.
WPIDS 86-000100, 1986.
WPIDS 78-46595A, 1978.

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