Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Patent
1995-12-04
1998-09-01
Niebling, John
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
438745, 148DIG51, H01L 21302
Patent
active
058011030
ABSTRACT:
The present invention is directed to a novel etching process for a semiconductor material which inhibits corrosion of metal comprised of pretreating the material, preferably with a surfactant, and then exposing the material to a mixture comprising a buffered oxide etch.
REFERENCES:
patent: 4040897 (1977-08-01), Blish et al.
patent: 5591354 (1997-01-01), Patel et al.
Cathey David A.
Chadha Surjit S.
Rasmussen Robert T.
Micro)n Technology, Inc.
Niebling John
Pham Long
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