Etching process for micromachining crystalline materials and...

Optical waveguides – Integrated optical circuit

Reexamination Certificate

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Details

C385S129000, C385S088000, C385S092000, C257S466000, C257S622000, C438S029000, C438S031000, C438S042000, C438S043000

Reexamination Certificate

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06907150

ABSTRACT:
The present invention provides an optical microbench having intersecting structures etched into a substrate. In particular, microbenches in accordance with the present invention include structures having a planar surfaces formed along selected crystallographic planes of a single crystal substrate. Two of the structures provided are an etch-stop pit and an anisotropically etched feature disposed adjacent the etch-stop pit. At the point of intersection between the etch-stop pit and the anisotropically etched feature the orientation of the crystallographic planes is maintained. The present invention also provides a method for micromachining a substrate to form an optical microbench. The method comprises the steps of forming an etch-stop pit and forming an anisotropically etched feature adjacent the etch-stop pit. The method may also comprise coating the surfaces of the etch-stop pit with an etch-stop layer.

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