Etching process for making electrodes

Details Etching process for making electrodes Etching process for making electrodes

2005-01-04

2005-01-04

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

C216S108000, C216S023000, C156S345110

Reexamination Certificate

active

06838013

ABSTRACT:
Substantially transparent electrodes are formed on a substrate by a process including forming on the substrate, in order, a bottom high index layer, a metallic conductive layer, and a top high index layer with a conductivity of at least about 400 Ω/square; and chemically etching the bottom high index layer, the top high index layer and the conductive layer to form discrete electrodes in the metallic conductive layer.

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