Etching of metal

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

156901, C23F 108, C23F 102

Patent

active

041475810

ABSTRACT:
An improvement in an etching process in which the etched product, the surface of which is covered with a film of aqueous etching liquid containing ions of the material etched, is rinsed with an aqueous liquid and the resulting liquid, now containing said ions in dilute concentration, is passed through an ion exchanger to selectively remove the ions from the rinse liquid which thereupon can be reused or discharged, without ecological damage, from the ion exchanger. The ion exchanger when laden with such ions is regenerated by passage therethrough of at least a portion of an etcher make-up aqueous replenishing solution which contains a zero or low concentration of said ions. The resulting replenishing solution portion, now containing a small concentration of these ions, is passed to the etcher, e.g., to the etcher sump.

REFERENCES:
patent: 3310435 (1967-03-01), Robinson, Jr. et al.
patent: 3348657 (1967-10-01), Fredrikson
patent: 3532568 (1970-10-01), Kovell et al.
patent: 3705061 (1972-12-01), King
patent: 3905827 (1975-09-01), Goffredo et al.

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