Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Patent
1994-07-07
1996-05-21
Breneman, R. Bruce
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
216 93, 252 792, C01G 3900
Patent
active
055181317
ABSTRACT:
A molybdenum etching process which reduces hazardous treatment waste is disclosed. Etchants which can be used are ferric sulfate and ferric ammonium sulfate. Waste products resulting from this etch are Fe(OH).sub.3 and CaSO.sub.4.
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F. A. Cotton and G. Wilkinson, Advanced Inorganic Chemistry, 5th Ed., p. 717. Wiley-Interscience (1988) (Discussed on p. 5 of the Specification).
M. J. Grieco and D. L. Klein, Etching of Molybdenum Thin Films, IBM Technical Disclosure Bulletin, vol. 11, No. 10, Mar. 1969, p. 1246.
Chen Hsing H.
David Lawrence D.
Harris Derek B.
Breneman R. Bruce
Goudreau George
International Business Machines - Corporation
Soucar Steven
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