Etching methods and apparatus for producing semiconductor...

Details Etching methods and apparatus for producing semiconductor... Etching methods and apparatus for producing semiconductor...

2006-04-18

2006-04-18

Kunemund, Robert (Department: 1722)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S711000, C438S709000, C438S714000, C438S734000

Reexamination Certificate

active

07030027

ABSTRACT:
A multi-layered film on a semiconductor substrate is etched with a multi-step etching process by sequentially providing a plurality of process gases having different compositions in a chamber. A plasma discharge to excite the process gases is continued without an interruption during a switch to a different process gas. A relationship between different process gases desirable for the continuous plasma excitation is also disclosed. An apparatus suitable to practice this continuous plasma excitation process includes a process gas supply system having a gas reservoir. A mixture of at least two component gases is prepared and reserved in the reservoir, and is supplied to the etching chamber when it is needed.

REFERENCES:
patent: 5160407 (1992-11-01), Latchford et al.
patent: 5326727 (1994-07-01), Kook et al.
patent: 5471094 (1995-11-01), Lien
patent: 5665203 (1997-09-01), Nelson
patent: 5965461 (1999-10-01), Yang et al.
patent: 5972796 (1999-10-01), Yang et al.
patent: 5994234 (1999-11-01), Ouchi
patent: 6025273 (2000-02-01), Chen et al.
patent: 6037265 (2000-03-01), Mui et al.
patent: 6069091 (2000-05-01), Chang et al.
patent: 6083815 (2000-07-01), Tsai et al.
patent: 6103631 (2000-08-01), Soda et al.
patent: 6103632 (2000-08-01), Kumar et al.
patent: 6136211 (2000-10-01), Qian et al.
patent: 6350696 (2002-02-01), Shields et al.
Process Data Example for Hitachi M308 Microwave Plasma Etcher.

Affiliated with

Also associated with

Rating

Etching methods and apparatus for producing semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etching methods and apparatus for producing semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etching methods and apparatus for producing semiconductor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3560096