Etching method, method of manufacturing semiconductor...

Details Etching method, method of manufacturing semiconductor... Etching method, method of manufacturing semiconductor...

2006-12-26

2006-12-26

Fourson, George R. (Department: 2823)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S689000, C438S714000, C438S735000, C438S737000, 43

Reexamination Certificate

active

07153710

ABSTRACT:
In an etching method, an etching amount is controlled on the basis of the number of times an etching process is performed under the condition that an etching amount is determined independently of an etching time. Accordingly, the etching can be performed in step-by-step manner, whereby enabling the control of the etching amount at high precision.

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patent: 6004881 (1999-12-01), Bozada et al.
patent: 6232139 (2001-05-01), Casalnuovo et al.
patent: 2003/0155619 (2003-08-01), Imoto

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