Etching method, etching apparatus, and method for...

Details Etching method, etching apparatus, and method for... Etching method, etching apparatus, and method for...

2007-01-23

2007-01-23

Goudreau, George A. (Department: 1763)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C438S008000, C438S016000, C438S017000, C438S745000, C216S084000, C216S085000, C216S086000

Reexamination Certificate

active

10490049

ABSTRACT:
In order to reliably remove, by wet etching, a compound containing a metal and silicon, e.g., a silicate (101a) containing hafnium metal, the silicate (101a) is oxidized and then the oxidized silicate (101a) is wet-etched.

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Definitions of the term stoichiometric on the web as obtained from Google search engine on mar. 24, 2006.

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