Etching method, a substrate with a plurality of concave...

Details Etching method, a substrate with a plurality of concave... Etching method, a substrate with a plurality of concave...

2004-12-21

2008-03-04

Lee, Diane I. (Department: 2851)

Optical: systems and elements

Miscellaneous

C359S443000, C359S454000, C359S900000, C216S024000, C216S034000, C438S043000

Reexamination Certificate

active

07339758

ABSTRACT:
An etching method is disclosed. The etching method includes the steps of: preparing a substrate5;forming first and second films61, 62each having predetermined internal stress on the substrate so that the internal stresses of the first and second films61, 62are canceled out or reduced with each other; forming a plurality of initial holes63in the first and second films61, 62to form a mask6;and forming a plurality of concave portions3in the substrate5at portions corresponding to the plurality of initial holes63by subjecting the substrate5to an etching process using the mask6.

REFERENCES:
patent: 6363603 (2002-04-01), Nemoto et al.
patent: 6437918 (2002-08-01), Hamanaka et al.
patent: 2003/0219935 (2003-11-01), Miyairi et al.
patent: 2004/0229169 (2004-11-01), Sandstrom
patent: 07-181672 (1995-07-01), None
patent: 08-220306 (1996-08-01), None
patent: 11-52426 (1999-02-01), None
patent: 11-135582 (1999-05-01), None
patent: 2000-281383 (2000-10-01), None
patent: 2000-62173 (2002-02-01), None
patent: 2002-166557 (2002-06-01), None
patent: 2002-198495 (2002-07-01), None
patent: 2002-237601 (2002-08-01), None
patent: 2003-224265 (2003-08-01), None
Communication from Japanese Patent Office re: related application, May 12, 2002.

Affiliated with

Also associated with

Rating

Etching method, a substrate with a plurality of concave... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etching method, a substrate with a plurality of concave..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etching method, a substrate with a plurality of concave... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3960753