Etching metal carbide films

Details Etching metal carbide films Etching metal carbide films

2005-03-22

2005-03-22

Goudreau, George A. (Department: 1763)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S690000, C438S754000, C216S090000, C216S100000

Reexamination Certificate

active

06869889

ABSTRACT:
A metal carbide film may be etched in an etchant bath using sonication. The sonication may drive the reaction and, particularly, the gaseous byproducts in the form of carbon dioxide. Thus, the use of sonication invokes a favorable equilibrium to pattern metal carbide films, for example, for use as metal gate electrodes.

REFERENCES:
patent: 5057184 (1991-10-01), Gupta et al.
patent: 5245187 (1993-09-01), Kawase et al.
patent: 6303508 (2001-10-01), Alok
patent: 6375752 (2002-04-01), Otsuki et al.
patent: 6407014 (2002-06-01), Alok
“Effect of Ultrasonic Vibrations On the Anodic Dissolution of Hard Alloys”; Chaika, Elektronnaya Obrabotka Materialov; (1970); (23); abstract only.

Affiliated with

Also associated with

Rating

Etching metal carbide films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etching metal carbide films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etching metal carbide films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3453166