Etching liquid composition

Details Etching liquid composition Etching liquid composition

2005-07-05

2005-07-05

Webb, Gregory (Department: 1751)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C510S175000, C510S505000, C510S255000, C252S079400, C134S003000

Reexamination Certificate

active

06914039

ABSTRACT:
The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more compounds selected from the group consisting of polysulfonic acid compounds and polyoxyethylene-polyoxypropylene block copolymers.

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Database WPI, Section Ch, Week 200043, Derwent Publications Ltd., London, GB; AN 2000-483459 (XP002242409), Jan. 2000.

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