Etching device

Details Etching device Etching device

1984-08-24

1985-12-17

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156646, 204298, C23F 102, B44C 122, C03C 1500

Patent

active

045590990

ABSTRACT:
An etching device is disclosed which comprises a high frequency generator and a reactor in close proximity to each other. The reactor has a plasma zone and a processing zone which open directly into each other. The device is advantageous for chemical dry etching in that a short distance between plasma zone and processing zone offers the benefit of small radical loss.

REFERENCES:
patent: 4065369 (1977-12-01), Ogawa et al.
patent: 4298419 (1981-11-01), Suzuki et al.

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