Etching device

Details Etching device Etching device

1993-09-09

1994-12-27

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156637, H01L 21306, B44C 122

Patent

active

053762142

ABSTRACT:
An etching device performing an etching process on a material immersed in a etchant which is a mixture of acids of which the main components are fluoric acid, nitric acid, and acetic acid. The etching device includes a semiconductor electrode immersed in the etchant, an opposing electrode immersed in the etchant, an electron meter for detecting an electric potential difference between the semiconductor electrode and the opposing electrode, and a controller for uniformly controlling the nitrite ion concentration in the etchant from the electric potential difference between the semiconductor electrode and the opposing electrode, detected by the electronmeter.

REFERENCES:
patent: 3874959 (1975-04-01), Hoekstra et al.
patent: 3890215 (1975-06-01), DiLorenzo et al.
patent: 3959098 (1976-05-01), Schwartz
patent: 5129981 (1992-07-01), Wang et al.
patent: 5173149 (1992-12-01), Nojiri et al.
patent: 5266152 (1993-11-01), Iwasaki et al.
H. Muraoka, et al.--Controlled Preferential Etching Technology, pp. 327-338, The Electrochemical Society Softbound Sump., 1973.

Affiliated with

Also associated with

Rating

Etching device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etching device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etching device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-916200