Etching depth monitor

Details Etching depth monitor Etching depth monitor

1983-06-10

1984-11-06

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156627, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

044810610

ABSTRACT:
A monitor (9) for determining the amount of metal which has been removed during the course of a chemical etching process comprises an etch resistant substrate (10) whereon are affixed a plurality of metal foil areas (12A to 12H) each with its own, known substantially uniform thickness prior to the start of the etching process, indication of the progressive depth of etching being provided by which out of the plurality of areas of foil (12A to 12H) remain at any particular time after the commencement of etching.

REFERENCES:
patent: 3808067 (1974-04-01), Brown
patent: 4060097 (1977-11-01), Oxford

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