Etching composition and etching process

Details Etching composition and etching process Etching composition and etching process

2010-11-10

2011-11-01

Culbert, Roberts (Department: 1716)

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

C216S096000, C216S108000

Reexamination Certificate

active

08048331

ABSTRACT:
An etching composition which comprises at least one organic carboxylic acid compound selected from acetic acid, propionic acid, butyric acid, succinic acid, citric acid, lactic acid, malic acid, tartaric acid, malonic acid, maleic acid, glutaric acid, aconitic acid, 1,2,3-propanetricarboxylic acid and ammonium salts of these acids, a polysulfonic acid compound and water, and an etching process which comprises etching a conductive film comprising zinc oxide as the main component using the etching composition described above.

REFERENCES:
patent: 4517106 (1985-05-01), Hopkins et al.
patent: 4620934 (1986-11-01), Hopkins et al.
patent: 6828289 (2004-12-01), Peters et al.
patent: 2002/0055447 (2002-05-01), Ishikawa et al.
patent: 2003/0168431 (2003-09-01), Lee et al.
patent: 2004/0262569 (2004-12-01), Cho et al.
patent: 1187225 (2002-03-01), None
patent: 08-330692 (1996-12-01), None
patent: 2000-309888 (2000-11-01), None
patent: 3258780 (2001-12-01), None
patent: 2002-164332 (2002-06-01), None
patent: 3345408 (2002-08-01), None
Extended European Search Report dated Dec. 1, 2008, for EP Application No. 07 10 8809.

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