Etching apparatus using a plasma

Details Etching apparatus using a plasma Etching apparatus using a plasma

1978-03-28

1981-02-24

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156646, 204192E, 204298, 250531, C23F 102

Patent

active

042525950

ABSTRACT:
An etching device uses a gas activated by a plasma for etching semiconductor elements. The apparatus includes etching chamber in which semiconductor elements are horizontally held by a supporting plate or conveyer and etched. The etching gas introduced from the upper side of the semiconductor element to the down side thereof through holes formed in the supporting plate or conveyer.

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