Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1977-01-26
1978-06-13
Klein, David
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
156643, 156646, 204192E, C23F 102
Patent
active
040947220
ABSTRACT:
An etching device uses a gas activated by a plasma for etching a semiconductor element. The apparatus includes object feeding and etching chambers formed on the opposite sides of an airtight flat chamber and a support plate rotatably mounted in the flat chamber to bring the semiconductor element from the feeding chamber to the etching chamber in which the semiconductor element is etched by the vertically flowing activated gas.
REFERENCES:
patent: 3632494 (1972-01-01), Herte et al.
patent: 3827966 (1974-08-01), Needham
patent: 3906892 (1975-09-01), Cakenbagle
patent: 3933644 (1976-01-01), Skinner et al.
patent: 3971684 (1976-07-01), Muto
patent: 4009680 (1977-03-01), Fengler
Horiike Yasuhiro
Shibagaki Masahiro
Sumitomo Yasusuke
Yamamoto Shin-ichi
Klein David
Massie Jerome W.
Tokyo Shibaura Electric Co. Ltd.
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