Etching apparatus and method of etching a substrate

Details Etching apparatus and method of etching a substrate Etching apparatus and method of etching a substrate

1997-09-15

2000-03-21

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118719, 118720, 216 93, C23F 108

Patent

active

060398353

ABSTRACT:
A etcher (10) has an inner chamber (22) that is in communication with a collection chamber (17). A cover (33) is made from a substrate (11) and an outer housing (34). The cover (33) is attached to the etcher (10) so that the substrate (11) is suspended over the inner chamber (22). A recirculating system (29) is used to pass an etchant through a filter, into the inner chamber (22), across the substrate (11), into the collection chamber (17), and into a reservoir.

REFERENCES:
patent: 4165252 (1979-08-01), Gibbs
patent: 4600463 (1986-07-01), Aigo
patent: 5014737 (1991-05-01), Berman
patent: 5578167 (1996-11-01), Sooriakumar et al.

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