Etching and patterning an amorphous copolymer made from tetraflu

Details Etching and patterning an amorphous copolymer made from tetraflu Etching and patterning an amorphous copolymer made from tetraflu

1993-11-05

1995-11-21

Ryan, Patrick J.

Stock material or miscellaneous articles

Composite

Of fluorinated addition polymer from unsaturated monomers

428195, 428209, 428422, 428901, B32B 900

Patent

active

054685613

ABSTRACT:
This is a device and method of forming such, wherein the device has an amorphous "TEFLON" (TFE AF) layer. The device comprising: a substrate; a TFE AF 44 layer on top of the substrate; and a semiconductor layer 42 on top of the TFE AF 44 layer. The device may be an electronic or optoelectronic device. The semiconductor layer may be a metal or other substance.

REFERENCES:
patent: 3136680 (1964-06-01), Hochberg
patent: 4886699 (1989-12-01), Carroll et al.
patent: 5011732 (1991-04-01), Takeuchi et al.

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