Etching and etchant removal apparatus

Details Etching and etchant removal apparatus Etching and etchant removal apparatus

1980-09-25

1983-08-09

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

134 49, 134 57R, 156640, 156642, C23F 102

Patent

active

043977081

ABSTRACT:
Etching method and etching and etchant removal apparatus. A specific embodiment includes two sets of fan spray nozzles located adjacent to the etching chamber and positioned to direct a spray at the work piece as the work piece exits the etching chamber. A sensor is also located adjacent to the etching chamber for turning the nozzles on when the work piece is present. Hydrometer means for determining the specific gravity of the etchant solution controls one set of nozzles whereby the nozzles are turned on to decrease the density of the etchant and turned off to increase the density of the etchant.

REFERENCES:
patent: 3282273 (1966-11-01), Johnston et al.
patent: 3935041 (1976-01-01), Geffredo et al.
patent: 4333485 (1982-06-01), Karlsson et al.
Lecatsas and Merkel, Laminar Flow Coating, Western Electric Technical Digest No. 29, Jan. 1973, pp. 39-40.

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