Etching agents comprising .beta.-diketone and .beta.-ketoimine l

Metal treatment – Compositions

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148 23, 156903, B23K 3534

Patent

active

052213668

ABSTRACT:
This invention is a residue-free vapor-phase process for etching metallic layers during the manufacturing of integrated circuits. The process comprises contacting a portion of the metallic surface to be etched with an effective amount of an etching agent comprising a .beta.-diketone or .beta.-ketoimine dispersed in an atmosphere capable of oxidizing the metal to be removed at a temperature sufficient to form a volatile metal-ligand complex. The volatile metal-ligand complex is sublimed from the surface thereby etching successive layers of the metal.

REFERENCES:
patent: 2801194 (1957-07-01), Doerr
patent: 2801195 (1957-07-01), Doerr
patent: 2801196 (1957-06-01), Doerr
patent: 3301688 (1967-01-01), Simpelaar
patent: 3985586 (1976-10-01), Choby
patent: 3985587 (1976-10-01), Choby
patent: 4059218 (1977-11-01), Choby
patent: 4060191 (1977-11-01), Choby
patent: 4216035 (1980-08-01), Bakos
patent: 5116432 (1992-05-01), Kerner
Amendment under 37 C.F.R. 1.111 & Response to Restriction Requirement under 37 C.F.R. 1.143 re: 07/502,209.
First Office Action dated Jun. 22, 1990 re: 07/502,209.

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