Etched-facet ridge lasers with etch-stop

Details Etched-facet ridge lasers with etch-stop Etched-facet ridge lasers with etch-stop

2011-08-30

2011-08-30

Nguyen, Dung T (Department: 2828)

Coherent light generators

Particular active media

Semiconductor

C372S044010, C372S045010, C372S046010

Reexamination Certificate

active

08009711

ABSTRACT:
A photonic device incorporates an epitaxial structure having an active region, and which includes a wet etch stop layer above, but close to, the active region. An etched-facet ridge laser is fabricated on the epitaxial structure by dry etching followed by wet etching. The dry etch is designed to stop before reading the depth needed to form the ridge. The wet etch completes the formation of the ridge and stops at the wet etch stop layer.

REFERENCES:
patent: 5309465 (1994-05-01), Antreasyan et al.
patent: 2006/0018352 (2006-01-01), Song et al.

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