Etched article

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1983-01-03

1984-06-12

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

156643, 156650, 156651, 156652, 156656, 156657, 204 15, 2041294, 204192E, 204192M, 360122, 360126, C23C 1500, C25F 300, C25F 500

Patent

active

044540140

ABSTRACT:
A method for fabricating a metallic pattern on a substrate is disclosed. The method consists of depositing an adhesive and/or plating base material on a substrate upon which a narrow self-supporting border of photoresist is applied. An anodic layer is then deposited and the photoresist removed. The adhesive and plating base material is etched in those areas previously covered by the photoresist and fresh photoresist applied to encapsulate those areas of the anodic layer which form the final pattern of interest. The unwanted anodic material is then etched and the photoresist removed.

REFERENCES:
patent: 3745094 (1973-07-01), Greene
patent: 3853715 (1974-12-01), Romankin
patent: 3878006 (1975-04-01), Rice
patent: 3878007 (1975-04-01), Feldstein et al.
patent: 3901770 (1975-08-01), Littwin
patent: 4131525 (1978-12-01), Tijburg et al.
patent: 4260450 (1981-04-01), Neu
patent: 4274935 (1981-06-01), Schmelzer
patent: 4315985 (1982-02-01), Castellani et al.
patent: 4369477 (1983-01-01), Hanaoka

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