Etchants containing filterable surfactant

Compositions – Etching or brightening compositions

Reexamination Certificate

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C438S292000, C134S003000

Reexamination Certificate

active

07112289

ABSTRACT:
An improved etching and cleaning composition for semiconductor devices is provided in which the etch solution incorporates a novel surfactant comprising a combination of a linear perfluorocarboxylic acid, a cyclic amine and an aliphatic alcohol.

REFERENCES:
patent: 4517106 (1985-05-01), Hopkins
patent: 4761245 (1988-08-01), Scardera
patent: 4795582 (1989-01-01), Ohmi
patent: 5496485 (1996-03-01), Maternaghan
patent: 2005/0169096 (2005-08-01), Lee et al.

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