Etchant for silicon nitride and borosilicate glasses and method

Details Etchant for silicon nitride and borosilicate glasses and method Etchant for silicon nitride and borosilicate glasses and method

1975-05-14

1976-09-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Methods

156 15, 252 793, 252 794, C03C 1500, C09K 1308, C09K 1306

Patent

active

039792382

ABSTRACT:
Superimposed layers of silicon nitride and borosilicate glasses are etched with a mixture of phosphoric acid, fluoboric acid and glycerine at a temperature of between 100.degree.C and 110.degree.C. The etchang does not adversely affect photoresists so that the etchant can be used to etch through regions of the superimposed layers defined by a photoresist masking layer.

REFERENCES:
patent: 3642549 (1972-02-01), Couture et al.
patent: 3767491 (1973-10-01), Chough
patent: 3784424 (1974-01-01), Chang
patent: 3811974 (1974-05-01), Squillace et al.

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