Etchant for etching silicon

Details Etchant for etching silicon Etchant for etching silicon

1975-07-28

1976-11-30

Powell, William A.

Compositions

Etching or brightening compositions

Inorganic acid containing

156 8, 156 17, C09K 1308

Patent

active

039948170

ABSTRACT:
A solution comprising fluoroboric acid, nitric acid and ammonium fluoroborate is an isotropic etchant for monocrystalline and polycrystalline silicon which can be used to etch patterns which are delineated by etching masks formed of positive photoresists, thermally grown silicon oxide or deposited silox.

REFERENCES:
patent: 3520746 (1970-07-01), Johnson et al.
patent: 3562013 (1971-02-01), Mickelson et al.
patent: 3684719 (1972-08-01), Frey

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