Etchant composition

Details Etchant composition Etchant composition

1984-08-09

1986-04-15

Powell, William A.

Compositions

Etching or brightening compositions

Inorganic acid containing

156653, 156657, 156662, 252 793, C09K 1306, B44C 122, C03C 1500

Patent

active

045826242

ABSTRACT:
An aqueous etchant composition comprising hydrogen fluoride, ammonium fluoride and a surfactant selected from a group consisting of fluorine-containing carboxylic acids and their salts, with which very minute and complicated pattern can be etched onto an oxidized silicon film on a semiconductor substrate.

REFERENCES:
patent: 4055458 (1977-10-01), Niederprum et al.

Affiliated with

Also associated with

Rating

Etchant composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etchant composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etchant composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1437490