Etch solution and method

Details Etch solution and method Etch solution and method

1983-10-28

1984-07-03

Powell, William A.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

156668, 252 792, 427307, B29C 1708, C03C 1500, B44C 122, B05D 512

Patent

active

044579519

ABSTRACT:
In manufacturing a circuit which includes the step of etching a polymeric material in the presence of exposed metallic conductors, the polymer is etched with an aqueous solution comprising chromic acid [which may be added in the form of chromic oxide (CrO.sub.3)], sulfuric acid, phosphoric acid and water wherein the water added does not exceed 55 volume percent of the total volume.

REFERENCES:
patent: 3484270 (1969-12-01), Saubestre et al.
patent: 3620804 (1971-11-01), Bauer et al.
patent: 3808028 (1974-04-01), Lando
patent: 4144119 (1979-03-01), Dutkewych et al.
patent: 4378270 (1983-03-01), Brasch

Affiliated with

Also associated with

Rating

Etch solution and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etch solution and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etch solution and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1630333