Etch chamber with gas dispersing membrane

Details Etch chamber with gas dispersing membrane Etch chamber with gas dispersing membrane

1989-03-08

1995-10-17

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

1566461, B05C 500

Patent

active

054587247

ABSTRACT:
Processing gases in an etching chamber for semiconductor wafers are dispersed by a porous plastic membrane interposed between the source of gases and the wafer being processed. A peripheral outlet in the chamber wall exhausting gases is also traversed by a porous plastic membrane.

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Laboratory Membrane Filtration, Millipore Membrane Filtration Technology, date unknown, originating with Millapore Corporation, 80 Ashby Road, Bedford, Massachusetts 01730.
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