Estimating overlay error and optical aberrations

Details Estimating overlay error and optical aberrations Estimating overlay error and optical aberrations

2006-07-21

2008-12-09

Lauchman, L. G (Department: 2877)

Optics: measuring and testing

Shape or surface configuration

Triangulation

C356S124000, C356S635000, C356S601000, C430S030000, C355S053000, C355S055000

Reexamination Certificate

active

07463367

ABSTRACT:
Aberration marks, which may be used in conjunction with lenses in optical photolithography systems, may assist in estimating overlay errors and optical aberrations. Aberration marks may include an inner polygon pattern and an outer polygon pattern, wherein each of the inner and outer polygon patterns include a center, and two sets of lines and spaces having a different feature size and pitch that surround the outer polygon pattern. In some embodiments, the marks can be used with scatterometry or scanning electron microscope devices.

REFERENCES:
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5355306 (1994-10-01), Waldo
patent: 5365072 (1994-11-01), Turner et al.
patent: 5371774 (1994-12-01), Cerrina et al.
patent: 5701013 (1997-12-01), Hsia et al.
patent: 5712707 (1998-01-01), Ausschnitt et al.
patent: 5715063 (1998-02-01), Ota
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5838450 (1998-11-01), McCoy et al.
patent: 5841520 (1998-11-01), Taniguchi
patent: 5939226 (1999-08-01), Tomimatu
patent: 5966201 (1999-10-01), Shiraishi et al.
patent: 5978085 (1999-11-01), Smith et al.
patent: 6011611 (2000-01-01), Nomura et al.
patent: 6097473 (2000-08-01), Ota et al.
patent: 6118185 (2000-09-01), Chen et al.
patent: 6137578 (2000-10-01), Ausschnitt
patent: 6165656 (2000-12-01), Tomimatu
patent: 6172740 (2001-01-01), Suzuki
patent: 6238851 (2001-05-01), Nishi
patent: 6317211 (2001-11-01), Ausschnitt et al.
patent: 6333776 (2001-12-01), Taniguchi
patent: 6356343 (2002-03-01), Shiraishi et al.
patent: 6396569 (2002-05-01), Zheng et al.
patent: 6407396 (2002-06-01), Mih et al.
patent: 6429930 (2002-08-01), Littau et al.
patent: 6432591 (2002-08-01), Baluswamy et al.
patent: 6436595 (2002-08-01), Credendino et al.
patent: 6440612 (2002-08-01), Baggenstoss
patent: 6453457 (2002-09-01), Pierrat et al.
patent: 6465141 (2002-10-01), Boettiger et al.
patent: 6486956 (2002-11-01), Byers et al.
patent: 6498685 (2002-12-01), Johnson
patent: 6523162 (2003-02-01), Agrawal et al.
patent: 6538830 (2003-03-01), Boettiger et al.
patent: 6539521 (2003-03-01), Pierrat
patent: 6545829 (2003-04-01), Boettiger et al.
patent: 6573015 (2003-06-01), Fujimoto
patent: 6577406 (2003-06-01), Bruce et al.
patent: 6584609 (2003-06-01), Pierrat et al.
patent: 6596448 (2003-07-01), Lai et al.
patent: 6606152 (2003-08-01), Littau et al.
patent: 6617080 (2003-09-01), Kawachi
patent: 6625801 (2003-09-01), Pierrat
patent: 6699627 (2004-03-01), Smith et al.
patent: 6730444 (2004-05-01), Bowes
patent: 6744143 (2004-06-01), Matsufusa et al.
patent: 6822342 (2004-11-01), Baluswamy et al.
patent: 2001/0017693 (2001-08-01), Zheng et al.
patent: 2001/0055103 (2001-12-01), Nishi
patent: 2002/0041369 (2002-04-01), Boettiger et al.
patent: 2002/0041373 (2002-04-01), Littau et al.
patent: 2002/0070355 (2002-06-01), Ota
patent: 2002/0085297 (2002-07-01), Boettiger et al.
patent: 2002/0137237 (2002-09-01), Byers
patent: 2002/0137240 (2002-09-01), Byers et al.
patent: 2002/0137303 (2002-09-01), Byers et al.
patent: 2002/0182516 (2002-12-01), Bowes
patent: 2003/0002031 (2003-01-01), Littau et al.
patent: 2003/0002043 (2003-01-01), Abdulhaim et al.
patent: 2003/0021465 (2003-01-01), Adel et al.
patent: 2003/0021466 (2003-01-01), Adel et al.
patent: 2003/0021467 (2003-01-01), Adel et al.
patent: 2003/0026471 (2003-02-01), Adel et al.
patent: 2003/0035090 (2003-02-01), Imai et al.
patent: 2003/0081193 (2003-05-01), White et al.
patent: 2003/0087192 (2003-05-01), Gau et al.
patent: 2003/0090661 (2003-05-01), Kobayashi
patent: 2003/0095267 (2003-05-01), Mieher et al.
patent: 2003/0117599 (2003-06-01), Takakuwa et al.
patent: 2003/0152851 (2003-08-01), Ideda
patent: 2003/0156276 (2003-08-01), Bowes
patent: 2004/0239934 (2004-12-01), Bowes
Ausschnitt, Christopher P., et al., “Seeing the forest for the trees: a new approach to CD control”,SPIE, 3332, 212-220.
Kim, Young C., “Automatic In-situ Focus Monitor Using Line Shortening Effect”,SPIE, 3677, (1999), 184-193.

Affiliated with

Also associated with

Rating

Estimating overlay error and optical aberrations does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Estimating overlay error and optical aberrations, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Estimating overlay error and optical aberrations will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4026243