Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Reexamination Certificate
2006-11-30
2010-02-23
Wu, David (Department: 1796)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
C526S321000, C526S328500, C430S313000, C524S556000
Reexamination Certificate
active
07666967
ABSTRACT:
A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1is F or C1-C6fluoroalkyl, R2is H or C1-C8alkyl, R3is O or C1-C6alkylene, R4and R5each are H or C1-C10alkyl or fluoroalkyl, and R6is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.
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Endo Masayuki
Harada Yuji
Hatakeyama Jun
Kawai Yoshio
Komoriya Haruhiko
Birch & Stewart Kolasch & Birch, LLP
Central Glass Co. Ltd.
Nguyen Vu
Panasonic Corporation
Shin-Etsu Chemical Co. , Ltd.
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