Ester compound, polymer, resist composition, and patterning...

Details Ester compound, polymer, resist composition, and patterning... Ester compound, polymer, resist composition, and patterning...

2006-11-30

2010-02-23

Wu, David (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S321000, C526S328500, C430S313000, C524S556000

Reexamination Certificate

active

07666967

ABSTRACT:
A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1is F or C1-C6fluoroalkyl, R2is H or C1-C8alkyl, R3is O or C1-C6alkylene, R4and R5each are H or C1-C10alkyl or fluoroalkyl, and R6is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.

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