ESD-resistant photomask and method of preventing mask ESD...

Details ESD-resistant photomask and method of preventing mask ESD... ESD-resistant photomask and method of preventing mask ESD...

2007-08-07

2007-08-07

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10810920

ABSTRACT:
An ESD-resistant photomask and method of preventing mask ESD damage is disclosed. The ESD-resistant photomask includes a mask substrate, a pattern-forming material provided on the substrate, a circuit pattern defined by exposure regions etched in the pattern-forming material, and positive or negative ions implanted into the mask substrate throughout ion implantation regions. The ions in the ion implantation regions dissipate electrostatic charges on the mask, thus preventing the buildup of electrostatic charges which could otherwise attract image-distorting particles to the mask or damage the mask.

REFERENCES:
patent: 5585299 (1996-12-01), Hsu
patent: 6984475 (2006-01-01), Levinson et al.
patent: 2005/0051848 (2005-03-01), Ker et al.

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