Erosion mitigation for collector optics using electric and...

Details Erosion mitigation for collector optics using electric and... Erosion mitigation for collector optics using electric and...

2004-01-15

2008-09-09

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S50400H, C250S3960ML

Reexamination Certificate

active

07423275

ABSTRACT:
A magnetic and/or electric field may be generated around collector optics in an EUV lithography system to deflect debris particles from the reflective surfaces of the optics. The magnetic and/or electric field may be generated by a solenoid structure around the optics or by passing current through inner an outer shells in a nested shell arrangement.

REFERENCES:
patent: 6972421 (2005-12-01), Melnychuk et al.
patent: 2005/0140945 (2005-06-01), Banine et al.
Tsai et al., “Different electrostatic methods for making electret filters,” Jnl. of Electrostatics 54 (2002), pp. 333-341.
Kravtsov et al., “Analysis of the polarization state of melt-spun polypropylene fibers,” Jnl. of Materials Proc. Technol., 124 (2002), pp. 160-165.

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