Equipment for producing coatings having a rotationally symmetric

Details Equipment for producing coatings having a rotationally symmetric Equipment for producing coatings having a rotationally symmetric

1984-02-01

1985-10-22

Metz, Andrew H.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

045486980

ABSTRACT:
The invention concerns equipment for producing coatings having a rotationally symmetric thickness profile on substrates. The equipment comprises an evaporizing cathode and, for each substrate, a mask and a rotatable substrate holder arranged behind the mask. The mask has a cut-away portion such that the desired thickness profile of the coating can be produced by rotating the substrate.
According to the invention and for the purpose of increasing the throughput of the equipment while maintaining close tolerances for the thickness profile of the coatings, a plurality of masks (6) and a plurality of substrate holders (13) associated with the masks are provided on a common movable frame (1). The movable frame (1) is displaceable relatively to the evaporizing cathode (10), continuous rotary movement being imparted to the substrate holders.

REFERENCES:
patent: 4303489 (1981-12-01), Morrison, Jr.
patent: 4409087 (1983-11-01), Quick

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