Coating apparatus – Gas or vapor deposition – With treating means
Patent
1988-04-11
1990-06-26
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, 427 531, C23C 1648
Patent
active
049362526
ABSTRACT:
An equipment for manufacturing semiconductor devices has: a reaction chamber in which a substrate to be processed is placed; means for evacuating the reaction chamber; means for introducing a reaction gas into the reaction chamber; means for applying polarized light to the surface of the substrate for the purpose of depositing a thin film on the surface of the substrate using a photochemical reaction between the light and the reaction gas; and means for adjusting the direction of polarization of the light so as to be substantially perpendicular to the longitudinal axis of a stepped circuit pattern present on the surface of the substrate for the purpose of flattening the circuit pattern.
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Andreatta Appl. Phys. Lett. 40(2), 1-15-82, pp. 183-185.
Murayama Seiichi
Okuhira Hidekazu
Shintani Akira
Tsujii Kanji
Wada Yasuo
Bueker Richard
Hitachi , Ltd.
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