Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
1998-09-18
2002-08-20
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S097000
Reexamination Certificate
active
06438439
ABSTRACT:
BACKGROUND
Design of equipment in the semiconductor industry (e.g., tools such as plasma etchers and CVD deposition reactors) typically begins with a customer's performance specification, such as a particular etch rate and uniformity for a particular material, and then applies experience plus physical models to create a design to meet this specification. Perturbations of the initial design follow if the initial design fails to meet the specification.
This approach has problems for the customer, including the all-to-often changes in the desired specification during or after the design work.
SUMMARY OF THE INVENTION
The present invention provides a design and evaluation method which replaces the tool specification with a requirements region plus associated evaluation functions defined on the requirements region; the evaluation method employs the evaluation functions and the design method uses the evaluation in an iterative feedback design.
This has advantages including an evaluation and design which accommodates specification changes.
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Barna Gabriel G.
Burch Richard G.
Davis Joseph C.
Mozumder Purnendu K.
Bahta Kidest
Brady W. James
Hoel Carlton H.
Picard Leo
Telecky , Jr. Frederick J.
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