Epoxy resin stilbenes and process for producing the same by phot

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate

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522170, 549560, 20415764, 20415765, 20415769, 20415782, 20415792, C07D30324, C08G 5924

Patent

active

058543708

ABSTRACT:
The invention provides a cis-stilbene type epoxy resin having lower melting point and lower viscosity than the trans-stilbene type epoxy resin hitherto known. The stilbene type epoxy resin has a cis-isomer content of essentially 100%, or in the alternative, at least about 10% with the rest being the trans-isomer, and is based on the following general formula (1): ##STR1## wherein R.sub.1 to R.sub.8 are independently an acyclic or cyclic alkyl group, a hydrogen atom, or a halogen atom. Production processes for these epoxy resins are also disclosed.

REFERENCES:
patent: 4462901 (1984-07-01), Dhein
patent: 5266405 (1993-11-01), Kirchmeyer
patent: 5460860 (1995-10-01), Hefner et al.
Griffith, James R., `Epoxy Resins Containing a Specific Vulnerablity`, ACS Symposium Series, vol. 114, pp. 259-262 (1979).
Osada & Katsumura, `Photomechanochemical Energy Conversion in a Polyamide Containing a Stilbene Structure in the Backbone`, Makromol. Chem., Rapid Commun. 2, pp. 441-415 (1981).
Chemical Abstracts 112:66404, "influence of Polar Solvents on Reaction Dynamices: Photoisomerization Studies of Dihydroxystilbene", Park et al.

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