Epoxy resin photoresist with iodoform and bismuth triphenyl

Details Epoxy resin photoresist with iodoform and bismuth triphenyl Epoxy resin photoresist with iodoform and bismuth triphenyl

1975-02-26

1976-08-31

Brammer, Jack P.

Gas separation: apparatus

Electric field separation apparatus

Electrode retaining or supporting means

96115R, 96115P, 20415918, 20415923, 20415924, 96 85, 96 87R, G03C 194, G03C 168

Patent

active

039778789

ABSTRACT:
Photopolymerizable compositions and processes for photopolymerizing such compositions are provided, said process comprising admixing with said epoxides, photosensitive organohalogen compounds in combination with an organometallic compound and thereafter applying energy to the resulting mixture. The organohalogens decompose to liberate an active catalyst which then serves to initiate polymerization of the epoxide material. The organometallic compound functions synergistically with the organohalogen to enhance the film forming properties of the resulting polymer and or sensitivity of the polymerizable system.

REFERENCES:
patent: 3427259 (1969-02-01), Garty et al.
patent: 3522194 (1970-07-01), Hada et al.
patent: 3708296 (1973-01-01), Schlesinger
patent: 3711391 (1973-01-01), Feinberg
patent: 3720634 (1973-03-01), Statton
patent: 3721617 (1973-03-01), Watt

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