EPL mask processing method and device thereof

Details EPL mask processing method and device thereof EPL mask processing method and device thereof

2006-06-13

2006-06-13

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C430S296000, C430S328000, C430S394000, C430S942000

Reexamination Certificate

active

07060397

ABSTRACT:
A method of correcting a defective portion of an exposure window in a lithography mask, such as an EPL mask, includes a first step of irradiating a defective portion of the exposure window using a charge particle beam to perform correction processing, and a second step of irradiating another portion of the exposure window with the charged particle beam to eliminate attached matter therefrom, the attached matter consisting of particles ejected from the defective portion of the exposure window as a result of irradiation with the charged particle beam during the first step. The first step and the second step are sequentially repeated N times, wherein N is an integer of 2 or more, to thereby reduce the time needed for eliminating the attached matter.

REFERENCES:
patent: 4548883 (1985-10-01), Wagner
patent: 5882823 (1999-03-01), Neary

Affiliated with

Also associated with

Rating

EPL mask processing method and device thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with EPL mask processing method and device thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and EPL mask processing method and device thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3632815