Epitaxial wafer for a semiconductor light emitting device,...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With heterojunction

Reexamination Certificate

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Details

C257S097000, C257S102000, C257S103000, C257S201000, C257S615000, C257SE33027, C257SE33029, C257SE33031, C257SE33032, C438S047000

Reexamination Certificate

active

07622745

ABSTRACT:
A n-type GaAs buffer layer2, a n-type GaInP buffer layer3, a n-type AlGaInP cladding layer4, an undoped AlGaAs guide layer5, an AlGaAs/GaAs multiquantum well (MQW) active layer6, a first p-type AlGaInP cladding layer7, a p-type GaInP etching stopper layer8, a second p-type AlGaInP cladding layer9, a C-doped AlGaAs layer (Zn-diffusion suppressing layer)10, a p-type GaInP intermediate layer11, and a p-type GaAs cap layer12are sequentially grown on a n-type GaAs substrate1.

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Machine Translation of Japanese Publication No. 09-069667; Mar. 11, 1997.

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