Epitaxial layer on a heterointerface

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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257 20, 257 22, 257190, 257200, H01L 2906, H01L 310328, H01L 310336, H01L 31072

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059593083

ABSTRACT:
Heteroepitaxy of lattice-mismatched semiconductor materials such as GaAs (110) on silicon (102) is accomplished by formation of a defect annihilating grid (104) on the silicon (102) prior to the epitaxy of the GaAs (110).

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