Epitaxial heater apparatus and process

Chemical apparatus and process disinfecting – deodorizing – preser – Physical type apparatus – Crystallizer

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Details

118716, 118719, 118725, 118728, 373117, 373159, C30B 2306, C30B 3500

Patent

active

047770228

ABSTRACT:
Chemical vapor deposition apparatus has a quartz envelope supporting a resistance heater. A boron nitride pill box configured core supports resistance heater windings. The core has a base having a cylindrical upper portion defining a hollow chamber and an upper annular ring. A circular top includes an upper circular portion and lower circular portion mating with the base. The annular ring surface is in thermal contact with the upper circular portion to transfer heat from the annular ring to the circular top. A zirconia insulator cups the core, providing heat insulation, in conjunction with a heat shield coating in the quartz envelope interior. Arrays of quartz envelope heaters provide for mass production of semiconductors. A horizontal configuration includes a laminar flow head and disposed at an angle to the horizontal.
In use, a current applied to the windings develops high temperatures for chemical vapor deposition growing of semiconductors on substrates disposed above the envelope with minimal energy utilization. When heated, the heat is transmitted significantly upward along the annular surface of the core, then to the top of the core above the hollow chamber, where the heat is transmitted inwardly from adjacent the annular surface, achieving a generally flat temperature across the surface of the core's top and then maintains that uniform temperature, when the heat is transmitted to a substrate.

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Mellor, Inorganic and Theoretical Chemistry, vol. XI, Longmans, Green and Co., New York, 1948, p. 518.
Katchmer, "A Low-Cost Aerospace Heater", Microwaves & RF, Sep. 1983.
"Quartz Envelope for MOCVD", Semiconductor International, Oct. 1983 at 34.
Inside R & D, Fort Lee, New Jersey, Aug. 3, 1983.
S. I. Boldish, J. S. Ciofalo and D. H. Barker, "The Quartz Envelope Heater: A New Heating Technique for MOCVD Systems", technical report for The Aerospace Corporation, releasable through the NTIS, Report No. SD-TR-83-31, dated May 16, 1983.
"2 Devise Better Way to Heat Substrate", The Aerospace Corporation Orbiter, Jul. 20, 1983.

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