Optical waveguides – With optical coupler – Particular coupling structure
Reexamination Certificate
2006-01-17
2006-01-17
Palmer, Phan T.H. (Department: 2874)
Optical waveguides
With optical coupler
Particular coupling structure
C385S129000, C065S386000, C065S473000
Reexamination Certificate
active
06987912
ABSTRACT:
A method to form a semiconductor taper without etching the taper surfaces. In one embodiment, a semiconductor waveguide is formed on a workpiece having an unetched top surface; e.g., using a silicon insulator (SOI) wafer. A protective layer is formed on the waveguide. The protective layer is patterned and etched to form a mask that exposes a portion of the waveguide in the shape of the taper's footprint. In one embodiment, selective silicon epitaxy is used to grow the taper on the exposed portion of the waveguide so that the taper is formed without etched surfaces. Micro-loading effects can cause the upper surface of the taper to slope toward the termination end of the taper.
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Blakely , Sokoloff, Taylor & Zafman LLP
Intel Corporation
Palmer Phan T.H.
Stein James D.
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