Optical waveguides – Integrated optical circuit
Reexamination Certificate
2005-10-18
2005-10-18
Kim, Ellen E. (Department: 2874)
Optical waveguides
Integrated optical circuit
C385S043000, C385S050000
Reexamination Certificate
active
06956983
ABSTRACT:
A method to form a semiconductor taper without etching the taper surfaces. In one embodiment, a semiconductor waveguide is formed on a workpiece having an unwatched top surface; e.g., using a silicone on insulator (SOI) wafer. A protective layer is formed on the waveguide. The protective layer is patterned and etched to form a mask that exposes a potion of the waveguide in the shape of the taper's footprint. In one embodiment, selective silicone epitaxy is used to grow the taper on the exposed portion of the waveguide so that the taper is formed without etched surfaces. Micro-loading effects can cause the upper surface of the taper to slope toward the termination end of the taper.
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Blakely , Sokoloff, Taylor & Zafman LLP
Intel Corporation
Kim Ellen E.
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