Epitaxial growth apparatus

Details Epitaxial growth apparatus Epitaxial growth apparatus

1975-12-24

1976-11-09

Kaplan, Morris

Coating apparatus

Immersion or work-confined pool type

Work extending through pool-confining wall area

156622, B05C 309

Patent

active

039903923

ABSTRACT:
Method of and device for the epitaxial deposition of a layer of a semiconductor material on a substantially flat side of a crystalline substrate from a melt which contains the semiconductor material in which a crucuble is used having a slide and the contact between the melt and the substrate is effected by moving said slide. The slide may form a separation between a space in which the melt is formed and a space in which the substrate is situated. The slide may also comprise a recess for the substrate.

REFERENCES:
patent: 2329378 (1943-09-01), Kuehner
patent: 3551219 (1970-12-01), Parish et al.

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